BGC > Produktsuche > Boron tribromide

Fe	7.4
Co	0.08
Ni	0.06
Cu	0.07
Ag	0.05
Au	0.07
Mn	0.01
Cr	0.09
Ti	0.8
Zn	3.2
Be	0.03
Al	0.7
Ga	0.01
Sn	0.05
Sb	0.01
Bi	0.01
Mo	0.02
Pt	0.01
Pd	0.01
Na	0.08
Mg	0.03
Ca	0.05
Sr	0.01
Ba	0.01
Cd	0.01
Pb	0.04
As	0.07
Bi	0.01

mp	− 46 °C(lit.)
bp	~90 °C
Density	2.60 g/mL at 20 °C(lit.)
vapor Density	8.6 (vs air)
vapor pressure	40 mm Hg ( 14 °C)
Fp	30 °F
storage temp	Poison room
Color	colorless
Sensitive	Moisture Sensitive
Merck	14,1347
Stability	Stable, but reacts violently with water.
Item Results（ PPM）
Fe 7.4
Co 0.08
Ni 0.06
Cu 0.07
Ag 0.05
Au 0.07
Mn 0.01
Cr 0.09
Ti 0.8
Zn 3.2
Be 0.03
Al 0.7
Ga 0.01
Sn 0.05
Sb 0.01
Bi 0.01
Mo 0.02
Pt 0.01
Pd 0.01
Na 0.08
Mg 0.03
Ca 0.05
Sr 0.01
Ba 0.01
Cd 0.01
Pb 0.04
As 0.07
Bi 0.01
Concluassion The results conforms with enterprise standards

Molecular Formula: BBr3
Molecular Weight: 250.52
Hazard Symbols: T+,C,F,N
UN Number: UN 3390 6.1/PG 1
WGKGermany: 3
PackingGroup: I
HS Code: 28129090

Molecular Fomula	BBr3
Molecular Weight	250.52
Appearance	Colorless fumes, viscous liquid
Purity	99.99%

Air Liquide manufactures BBr3 in a variety of grades to fit each application
(specifications range from 99.2% to 99.999%).
"Amber" material is a Technical grade suitable for laboratory use and as the starting material for production of electronic grade material.
The purified "Clear and Colorless" grade is devoid of free bromine and suitable for use in Pharmaceutical Manufacturing.
Our photovoltaic and semiconductor grade products are specified to low part per billion impurity levels to meet the rigorous requirements of the electronics industry.

Boron Tribromide is a strong Lewis Acid widely employed as a reagent or catalyst in a
variety of organic reactions. It is commonly used in pharmaceutical manufacturing as a
demethylating agent, notably in the manufacture of morphine derivatives.
It is also used as a Friedel-Crafts catalyst in a number of polymerization and alkylation
reactions, and as a starting material for various boron compounds.
In electronics applications, BBr3 has long been utilized in diffusion processes as a
boron source for p-type doping of silicon. More recently BBr3 is being used in photovoltaic manufacturing, as increased solar conversion efficiencies have been demonstrated with boron doped n-type silicon cells.