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Categorias baseado em semiconductor: acetate acetic acid agent ammonia ammonium ammoniumfluoride anhydrous borate boron buffer buffered butylether butyletheracetate chloride choline chrom chromium compound cooh cyanide defreckle developer diethylaminotrimethylsilane dimethylformamide dmso epoxy etch etchant etching ethanol ether ethylene ethylmethyl fluoride gallium glycol grade hexachlorostannate hydrochloric hydrofluoric hydrogen hydroxide ketone metal methanol miak mixed mixture modified molding monomethyl monomethylether negativ negative nitric orthophosphoric oxide pentoxide perfluorocyclobutane peroxide pgmea phosphoric phosphorus phosphoryl positive potassium propylene puranal resist rinse silicon siodop sioget slsi solution solvent spinetch stripper teos tetraethoxysilane tetramethylammonium toluene triethyl trioxide vlsi xylene

nome IUPAC
CAS
EINECS
Fórmula
1330-20-7
215-535-7
C8H10
64-17-5
200-578-6
C2H5OH
108-88-3
203-625-9
C7H8
67-56-1
200-659-6
CH3OH
7697-37-2
231-714-2
HNO3
763-69-9
212-112-9
C7H14O3
142-96-1
205-575-3
C8H18O
7664-41-7
231-635-3
NH3
12125-01-8
235-185-9
NH4F
151-50-8
205-792-3
KCN
7722-84-1
231-765-0
H2O2
1303-86-2
215-125-8
B2O3
7647-01-0
231-595-7
HCl
78-93-3
201-159-0
C4H8O
10025-87-3
233-046-7
POCl3
150-46-9
205-760-9
C6H15BO3
68-12-2
200-679-5
C3H7NO
631-61-8
211-162-9
C2H7NO2
78-10-4
201-083-8
C8H20O4Si
16960-53-5
241-033-2
(NH4)2SnCl6


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