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acetate
acetic
acetylacetonate
acid
adhesive
agent
aluminum
ammonia
ammonium
ammoniumfluoride
anhydrous
barium
bicuvox
bismuth
borate
boron
buffer
buffered
butylether
butyletheracetate
calcium
chloride
choline
chrom
chromium
compound
cond
cooh
copper
cyanide
defreckle
developer
diethylaminotrimethylsilane
dimethylformamide
dmso
epoxy
etch
etchant
etching
ethanol
ether
ethylene
ethylhexanoate
ethylhexanoic
ethylmethyl
fixing
fluoride
gallium
glycol
grade
hexachlorostannate
hydrochloric
hydrofluoric
hydrogen
hydroxide
ionic
ketone
metal
methanol
miak
mixed
mixture
modified
molding
monomethyl
monomethylether
negativ
negative
neodecanoate
nitric
orthophosphoric
oxide
pentoxide
perfluorocyclobutane
peroxide
pgmea
phosphoric
phosphorus
phosphoryl
positive
potassium
propylene
puranal
resist
rinse
semicond
silicon
siodop
sioget
slsi
solid
solution
solvent
spinetch
stripper
strontium
supercond
teos
tetraethoxysilane
tetramethylammonium
thallium
toluene
triethyl
trioxide
viscous
vlsi
xylene
yttrium
IUPAC name
CAS
EINECS
Formula
Xylene for semiconductor
1330-20-7
215-535-7
C
8
H
1
0
Siodop for semiconductor
Sioget for semiconductor
Bicuvox - ionic conductor
Ethanol for semiconductor
64-17-5
200-578-6
C
2
H
5
OH
Toluene for semiconductor
108-88-3
203-625-9
C
7
H
8
Methanol for semiconductor
67-56-1
200-659-6
CH
3
OH
Spinetch for semiconductor
PBS rinse for semiconductor
Developer for semiconductor
Chrom-Etch for semiconductor
Solvent EEP for semiconductor
763-69-9
212-112-9
C
7
H
1
4
O
3
ITO-etchant for semiconductor
Nitric acid for semiconductor
7697-37-2
231-714-2
HNO
3
Conductor fixing adhesive j-35
HNO3-etchant for semiconductor
BOE 40:1 LST for semiconductor
NH4-F-etchant for semiconductor
H3PO4-etchant for semiconductor
PBS developer for semiconductor
Solvent EG-APB for semiconductor
Solvent NMP-AE for semiconductor
di-n-Butylether for semiconductor
142-96-1
205-575-3
C
8
H
1
8
O
Solvent DEK-DEM for semiconductor
Ethylene glycol for semiconductor
107-21-1
C
2
H
6
O
2
Defreckle etch 2 for semiconductor
Ammonia solution for semiconductor
7664-41-7
231-635-3
NH
3
Solvent HXL-MIAK for semiconductor
Solvent MIAK-MPK for semiconductor
Hydrochloric acid for semiconductor
7647-01-0
231-595-7
HCl
Anhydrous Etchant for semiconductor
di-Boron trioxide for semiconductor
1303-86-2
215-125-8
B
2
O
3
Ammonium fluoride for semiconductor
12125-01-8
235-185-9
NH
4
F
Hydrogen peroxide for semiconductor
7722-84-1
231-765-0
H
2
O
2
Potassium cyanide for semiconductor
151-50-8
205-792-3
KCN
Solvent DMSO-DMA-F for semiconductor
Ethylmethyl ketone for semiconductor
78-93-3
201-159-0
C
4
H
8
O
Hydrofluoric acid for semiconductor
Nitric acid etchant for semiconductor
Phosphoryl chloride for semiconductor
10025-87-3
233-046-7
POCl
3
Molding compound mp for semiconductors
Choline developer 5% for semiconductor
Triethyl borate (TEB) for semiconductor
150-46-9
205-760-9
C
6
H
1
5
BO
3
N,N-Dimethylformamide for semiconductor
68-12-2
200-679-5
C
3
H
7
NO
Silicon etching agent for semiconductor
Ammonium acetate buffer for semiconductor
631-61-8
211-162-9
C
2
H
7
NO
2
Phosphoric acid etchant for semiconductor
di-Phosphorus pentoxide for semiconductor
1314-56-3
215-236-1
P
2
O
5
Etching mixture NH4F-HF for semiconductor
Tetraethoxysilane (TEOS) for semiconductor
78-10-4
201-083-8
C
8
H
2
0
O
4
Si
Chromium etching mixture for semiconductor
Calcium neodecanoate, superconductor grade
27253-33-4
248-375-1
Gallium metal semiconductor grade 99.9999%
7440-55-3
231-163-8
Ga
Positive Resist Stripper for semiconductor
Negative Resist Stripper for semiconductor
Orthophosphoric acid 85 % for semiconductor
7664-38-2
231-633-2
H
3
PO
4
Oxide etch 7 / 1 modified for semiconductor
Etching mixture H3PO4-HNO3 for semiconductor
Mixed acid etchant NH4F-HF for semiconductor
Buffered oxide etch 50 / 1 for semiconductor
Strontium neodecanoate, superconductor grade
106705-37-7
C
2
0
H
3
8
O
4
Sr
Ammonium hexachlorostannate for semiconductor
16960-53-5
241-033-2
(NH
4
)
2
SnCl
6
Yttrium 2-ethylhexanoate, superconductor grade
103470-68-4
C
2
4
H
4
5
O
6
Y
Etching mixture NH4F-CH3COOH for semiconductor
Thallium(I) neodecanoate, superconductor grade
SN-12 negativ resist stripper for semiconductor
Bismuth(III) neodecanoate, superconductor grade
34364-26-6
251-964-6
C
3
0
H
5
7
BiO
6
Yttrium(III) neodecanoate, superconductor grade
68683-17-0
272-063-4
Y(OOC
1
0
H
1
9
)
3
Epoxy molding compound mc-10 for semiconductors
Aluminum acetylacetonate, superconductor grade
13963-57-0
237-741-6
C
1
5
H
2
1
AlO
6
Ammonium hydroxide solution semiconductor grade
1336-21-6
215-647-6
NH
3
Etching mixture HNO3-CH3COOH-HF for semiconductor
Perfluorocyclobutane; 99.998% semiconductor grade
115-25-3
204-075-2
C
4
F
8
N,N-Diethylaminotrimethylsilane for semiconductor
996-50-9
213-637-6
C
7
H
1
9
NSi
Ethylene glycol monomethyl ether for semiconductor
109-86-4
203-713-7
C
3
H
8
O
2
Thallium(I) 2-ethylhexanoate, superconductor grade
Etching mixture H3PO4-CH3COOH-HNO3 for semiconductor
Tetramethylammonium hydroxide 25 % for semiconductor
75-59-2
200-882-9
(CH
3
)
4
N-OH
Propylene glycol n-butyletheracetate for semiconductor
Barium neodecanoate, superconductor grade (25-29% Ba) solid
55172-98-0
259-509-3
C
2
0
H
3
8
BaO
4
Hydrofluoric acid 49 % Semiconductor Grade SLSI PURANAL®
Hydrofluoric acid 50 % Semiconductor Grade VLSI PURANAL®
Ammoniumfluoride - hydrofluoric acid etchant for semiconductor
Etching mixture ammonium fluoride/acetic acid for semiconductor
Etching mixture nitric acid/ammonium fluoride for semiconductor
Copper(II) neodecanoate, superconductor grade, ca. 60% in toluene
50315-14-5
256-536-2
Etching mixture phosphoric acid/nitric acid(65) for semiconductor
Propylene glycol monomethylether acetate (PGMEA) for semiconductor
108-65-6
203-603-9
C
6
H
1
2
O
3
Etching mixture ammonium fluoride/hydrofluoric acid for semiconductor
Calcium 2-ethylhexanoate, superconductor grade, solution in2-ethylhexanoic acid
136-51-6
205-249-0
2(C
8
H
1
5
O
2
).Ca
Calcium 2-ethylhexanoate, superconductor grade, 40% in 2-ethylhexanoic acid (3-8% Ca), viscous li
136-51-6
205-249-0
2(C
8
H
1
5
O
2
).Ca
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